| 摘要 |
PURPOSE:To improve work efficiency by calculating a resistance length in a prescribed resistance width first and preparing a resistance element pattern from the resistance length and position coordinates to be inputted newly when a desired resistance value is inputted. CONSTITUTION:An LSI designer designates the resistance value to be designed to an LSI resistance element generating device and designates the position coordinates on an LSI chip on which a resistance pattern is to be prepared. The LSI resistance element generating device first determines a resistance shape (resistance length L) using a built-in resistance value calculation expression in a resistance shape calculating means and next prepares a resistance mask pattern by a resistance pattern automatically preparing means so that the pattern can be made into the resistance shape (resistance length L). Thus, time which is necessary for the mask pattern forming work of the resistance element can be widely shortened compared with that for a conventional one, and work performance can be improved. |
