发明名称 EXPOSING AND DEVELOPING DEVICE FOR LONG-SIZED BASE MATERIAL
摘要 PURPOSE:To perform separation and development at an invariably prescribed proper speed without reference to the attenuation of the light source at an exposure part by providing a linear detector which detects a beltlike non-pattern part on a substrate to the separation and development part of the exposing and developing device for the long-sized base material, and performing the separation and development by an intermittent specific driving system which utilizes the detector. CONSTITUTION:A developing machine 9 such as a separation lever is provided which separates the transparent base 2 and unexposed photopolymerizing compound layer 31 of the long-sized base material for image formation conveyed through pinch rollers 8 and 8 from a substrate 1 to leave the exposed photopolymerizing compound layer 32 on the substrate 1. The linear detector 11 detects the beltlike non-pattern part 7 and sends it to a computer 13 through a relay circuit 12 and at the same time, signals 14 for the end of exposure and the start of base material sending is inputted to the computer 13 from the exposure part and sent to a DC motor 16 for driving the rolls 8 and 10 of a development part to control the stop and start of driving automatically, thereby performing the separation and development intermittently at the prescribed speed.
申请公布号 JPH01155351(A) 申请公布日期 1989.06.19
申请号 JP19870315055 申请日期 1987.12.12
申请人 NITTO DENKO CORP 发明人 SUGAWARA HIDEO;OUCHI KAZUO
分类号 G03F7/34;G03F7/00;G03F7/30 主分类号 G03F7/34
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