| 摘要 |
PURPOSE:To automatically detect, the type of resist layers spread on each substrate, and control the switching of developing conditions prior to the development, by arranging an infrared light source and a detector on and under a substrate, so that they sandwich a resist layer at a specified position and face each other at the time of detecting infrared rays. CONSTITUTION:On a specified position of a resist layer 23 spread on a substrate 21 retained horizontally which is transparent to infrared rays, are arranged an infrared light source 31 and an infrared ray detector 32. Retaining mechanisms 17, 33 arrange the above two equipments in the manner in which they sandwich a specified position of the resist layer, and face each other at the time of detecting infrared rays. In the above equipment arrangement, by detecting the intensity variation of infrared rays due to absorption by the resist layer, whether the resist layer is negative type or positive type is discriminated. According to the result, the kind of developing solution to be sprayed on the resist layer is automatically switched. Thereby each resist layer spread on many substrates can be developed with a specified condition. |
