| 摘要 |
PURPOSE:To keep the faltness of an X-ray exposure mask without locally concentrating force and in particular improve the flatness of an X-ray absorptive side by holding said mask keeping in succession the flatness from the inside to the outside of said mask. CONSTITUTION:A planar reference structure 2 has a through-hole 3 through the center thereof, which hole surrounds an X-ray absorptive pattern region 5 included by an X-ray exposure mask 4. A planar part 1 makes contact with an annular region 6 surrounding the X-ray absorptive pattern region 5. A plurality of the same annular grooves 7 are formed along the periphery of the through-hole 3 in the vicinity of the planar part 1 located in close vicinity of the through-hole 3. Each annular groove 7 is communicated with one end of an air hole 8, the other end of which hole is opened to the side of the planar reference structure 2 and connected to a vacuum unit. Hereby, the annular region 6 of the X-ray exposure mask 4 in contact with the annular groove 7 is attracted. |
