| 摘要 |
PURPOSE:To effectively utilize a target and to reduce the cost by forming a nitride layer on the surface of a metal in the target consisting of the metal to be dissociated by sputtering. CONSTITUTION:The sputtering target consisting of the metal (e.g., Fe) to be dissociated by sputtering is heated in the salt bath consisting essentially of a cyanogen compd. to form an Fe4N layer on the target surface. As a result, when the protective film consisting essentially of Fe4N is formed, the part as the remainder material is inexpensive, the sputtering material is effectively utilized, and the inexpensive target is obtained. |
