发明名称 Apparatus and process for the deposition of a thin layer on a transparent substrate, in particular for the manufacture of sheets of glass.
摘要 <p>An apparatus comprising cathode plates (1, 3) so placed as to form the walls of a rectangular parallelepiped, is able to produce an atom beam for the formation of a thin layer deposited on a substrate and simultaneously an ion beam for the bombardment of the layer during its formation. The process for the deposition is also described. Thin layers can be formed on transparent substrates of large size, to be used as sheets of glass for buildings and motorcars.</p>
申请公布号 EP0318441(A2) 申请公布日期 1989.05.31
申请号 EP19880830503 申请日期 1988.11.22
申请人 SOCIETA' ITALIANA VETRO-SIV-SPA 发明人 MASSARELLI, LIBERTO;SEBASTIANO, FRANCESCO
分类号 C03C17/09;C03C17/00;C03C23/00;C23C14/08;C23C14/32;C23C14/34 主分类号 C03C17/09
代理机构 代理人
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