| 摘要 |
PURPOSE:To reliably extract the features of various patterns by preparing a plurality of kinds of means for extracting any defect and providing means for selecting one among said defect extracting means. CONSTITUTION:An image as an object 11 to be measured such as a photomask is imaged on a sensor 13 after passage of a focusing lens 12. The image information obtained by the sensor 13 is converted into binary data through a binary circuit 14, and inputted into a feature extracting circuit 15. A plurality of kinds of templates for feature extraction are prepared in the feature extracting circuit 15, and an optimum one for the defect detector of the object 11 to be measured is selected, whose output is a defect signal. The template 17 is selected by an output from a parameter setting circuit 16. Since a template shape is properly selected in response to the shape of a pattern to be inspected, false information is reduced to form reliability. In addition, the general-purpose property of the title pattern inspection device is improved. |
