| 摘要 |
<p>PURPOSE:To make it possible to apply an exposure treatment to an object to be treated with a high yield by detecting the circumferential periphery of the object, determining from the detected periphery a predefined exposure region of the periphery of the object, and applying a light to the exposure region, thereby preventing foreign objects such as resist from being produced and unsharpness due to out-of-focus. CONSTITUTION:The circumferential periphery of an object 3 to be treated is detected. Then, a predefined exposure region of the periphery of the object 3 is determined from the detected periphery to apply a light to the exposure region. An exposing apparatus comprises a mount stage 2 for mounting the object 3 to be treated, a rotating mechanism 1 for rotating the mount base 2 at a predetermined speed, a light projector 11 facing the surface of the mount base 2, means for controlling the intensity of the light to be projected onto the object to be treated 3 from the light projector 11, a movable mechanism 12 for reciprocally moving the light projector 11 along a virtual line passing through the center of the surface of the mount stage 2, and means 14 for controlling the number of revolutions of the mount stage 2 according to the quantity of the projected light from the light projector 11. Further, for instance, means 8 for detecting the end face of the object 3 is provided near the mount stage 2.</p> |
