发明名称 MANUFACTURE OF SUPERCONDUCTING MULTILAYER SUBSTRATE
摘要 PURPOSE:To eliminate the damage of lower insulating layer and wiring part, by providing an over-etching preventing layer composed of Cu thin film, in a manufacturing method of superconducting multilayer substrate. CONSTITUTION:A lift-off layer 3 is eliminated by lift-off method or the like, and a flat board is obtained. A Cu layer 6 serving as an over etching preventing layer is thinly formed. An alkali-proof resist film 7 is formed and subjected to patterning. The Cu layer 6 is selectively etched. Then a second insulating layer 2' is formed, and subjected to patterning after a lift-off layer 3' and an acid resistant resist layer 4' are formed. By etching an exposed parts of the insulating layer 2' with acid, a desired insulating shape is obtained. Then the Cu layer 6 operates as the over-etching preventing layer, and the damage of the wiring 5 and the insulating layer 2 of a first layer is avoided.
申请公布号 JPH01117037(A) 申请公布日期 1989.05.09
申请号 JP19870272950 申请日期 1987.10.30
申请人 HITACHI LTD 发明人 YAMAZAKI TETSUYA;ISADA NAOYA;SOWA TAKAYOSHI
分类号 H01L21/306;H05K3/46 主分类号 H01L21/306
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