| 摘要 |
PURPOSE:To obtain a radiation property capable of sufficiently bearing even high speed driving by high frequency by a method where in after forming a projection part on a surface of a silicon substrate by etching, a silicon dioxide film is formed, a heat accumulating layer is formed thereon, and a heating part is formed on the projection part of the heat accumulating layer. CONSTITUTION:When a projection part 21 is formed on a silicon substrate 20 by etching, the projection part 21 is united with the silicon substrate to obtain good heat radiation effect, and heat accumulation disturbing high speed driving can be restrained. Further, by forming a silicon dioxide film 22 on a surface of 9 silicon substrate on which the projection is formed, the surface of the substrate is sufficiently strengthened, and a surface roughness for placing the heat accumulating layer to be later formed is obtained. Furthermore, heat constant (temperature increase) required for the heating part 26 can be secured by the heat accumulating layer to be formed on the silicon dioxide film. A nozzle plate 28 is joined to the ink jet head substrate 20 constructed thus at the end part by adhesives, and a nozzle hole (orifice) 28a is established at a position corresponding to the heating part 28 of this nozzle plate 28. |
