| 摘要 |
Disclosed is a nonvolatile semiconductor memory having a high access speed and high reliability. The memory includes a source diffusion region extending in one direction, a pair of first word lines arranged in parallel with the source diffusion region, such that the source diffusion region is interposed therebetween, drain diffusion regions disposed to face the source diffusion region, with the first word lines interposed therebetween, bit lines electrically connected to the drain diffusion regions and arranged to cross the first word lines, a channel region formed below each of the first word lines and positioned between the source diffusion region and the drain diffusion region, a floating gate electrode formed in an electrically floating manner above the channel region and below one of the pair of the first word lines, and a second word line formed above the source region and positioned between and electrically connected to the pair of first word lines.
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