| 摘要 |
PURPOSE: To prolong storage life and to improve processing allowance by incorporating a specific silenol ether in an acid decomposable compound. CONSTITUTION: In a positive radiation sensitive mixture containing a compound producing an acid by the action of chemical ray and the acid decomposable compound, the acid decomposable compound contains the silenol ether group expressed by formula I. In formula I, each of R1 and R2 expresses an alkyl, a cycloalkyl or the like, R3 expresses an alkyl, an aryl or the like, each of R4 -R6 expresses hydrogen, an alkyl or the like and R7 expresses hydrogen, an alkenyl, an alkenyl or the like. As a result, the improved storage life is attained, the excellent processing allowance is attained even in the etching method and the high structural resolution is enabled. |
