发明名称 X-RAY ANALYZING ELECTRON MICROSCOPE
摘要 PURPOSE:To remove an incorrect peak by fixing the electron beam radiation point, periodically changing the electron beam incident angle, and detecting characteristic X-rays emitted from a sample. CONSTITUTION:The deflection angles of deflecting coils 4a and 4b are set by a scanning section 15 in the relationship that the deflection angle by the deflecting coil 4a is theta and the deflection angle by the deflecting coil 4b is-2theta. An electron beam passes the same position on the optical axis for any theta, and a sample 5 is arranged at this position. The scanning section 15 repeatedly scans in the range of -3<=theta<=3 deg., for example, the electron beam incoming to the sample is repeatedly scanned to oscillate the incident angle in the range of + or -t3 deg. centering the electron beam radiation point on the sample. Incorrect X-rays are thereby generated only at the moment when the incident angle becomes the specific value, and the peak due to incorrect X-rays is almost suppressed.
申请公布号 JPH01105444(A) 申请公布日期 1989.04.21
申请号 JP19870261035 申请日期 1987.10.16
申请人 JEOL LTD 发明人 SUZUKI SEIICHI
分类号 H01J37/252;G01N23/225;H01J37/04;H01J37/141 主分类号 H01J37/252
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