Manufacturing Method of Ultre Purity Nitrous Oxide for Semiconductor and Display Industry,申请号KR20050130836-传众专利搜索

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发明名称	Manufacturing Method of Ultre Purity Nitrous Oxide for Semiconductor and Display Industry
摘要
申请公布号	KR100918567(B1)	申请公布日期	2009.09.21
申请号	KR20050130836	申请日期	2005.12.27
申请人		发明人
分类号	C01B21/22	主分类号	C01B21/22
代理机构		代理人
主权项
地址

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