| 摘要 |
A radiation-sensitive mixture which contains (A) a polymer comprised of repeat units represented by the formula <IMAGE> (I) where R is a hydrogen or a halogen atom, a cyanide group or an alkyl group of 1-4 carbon atoms, R1, R2 are identical or different, and each and R3 denotes a hydrogen or a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, an aryloxy group, an aroyl group or aralkyl group, R4 is a hydrogen atom or a divalent organic group which is linked to another unit represented by formula (I), X denotes an oxygen atom or one of the groups NR8, OCH2CHOHCH2OCO, OCH2CH2O and OCH2CH2OCO, where R8 is a hydrogen atom, alkyl or aryl group and A denotes the atoms required for completing a mononuclear or dinuclear carbocyclic or heterocyclic aromatic ring system, (B) a combination of (a) a compound which forms a strong acid under the action of actinic radiation and (b) a compound which has at least one acid-cleavable C-O-C bond and the solubility of which in a liquid developer is increased by the action of acid, is suitable for preparing printing plates and dry photoresists.
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