| 摘要 |
PURPOSE:To allow transfer of pattern by baking exposure to be made stably and precisely by measuring the illumination on the surface of an object to be illuminated by means of a means for detecting quantity of light which was arranged within light path of optical integrator and the surface to be illuminated and by converting the magnification of an afocal magnification variable optic system in accordance with the fluctuation of the illumination. CONSTITUTION:An aslant installed mirror 61 is arranged between a capacitor lens 44 in a light-collecting optic system 40 and a reticle R as a surface to be illuminated. And a means for detecting the quantity of light 60 consists of a light detector 62 for indirectly measuring the illumination on the reticle R surface by the reflected light from the mirror 61 and the mirror 61. Information on quantity of light from the means for detection the quantity of light 60 is input to the control means 70, it is judged whether illumination on the surface to be illuminated is within the allowable range in reference to specified standard value, signal is sent to a drive means for magnification conversion 80, and shift lenses 22 and 23 of an afocal magnification variable optical system 20 are shifted to convert into a specified magnification. It allows fluctuation of illumination on the surface to be illuminated due to fluctuation of output of an excimer laser light source 10 to be compensated. Also, signal from the means for detecting the quantity of light 60 is input into a means for detecting the quantity of integrated light 71 to integrate the quantity of exposure. Then, it is compared with the setting value of a means for setting the quantity of exposure 72 and the magnification is converted to allow excess or shortage to be compensated for the drive means 80. |
