发明名称 Ashing apparatus
摘要 An ashing apparatus includes a treatment chamber having an object to be processed therein, and a lamp chamber having an ultraviolet lamp that radiates the object with an ultraviolet beam. The ashing apparatus is configured to accurately maintain an irradiation distance between a light source and the object. Thus, it is possible to efficiently remove a smear from a wiring board. The treatment chamber and the lamp chamber are moved relative to each other and in parallel to a surface of the object to be processed. The treatment chamber has a stage that supports the object, a gas inlet opening for supplying a treatment gas into the treatment chamber, and a gas outlet opening for discharging the treatment gas. An ultraviolet transmitting window member that partitions the treatment chamber and the lamp chamber from each other is fixed to the treatment chamber.
申请公布号 US9402317(B2) 申请公布日期 2016.07.26
申请号 US201414896016 申请日期 2014.05.26
申请人 USHIO DENKI KABUSHIKI KAISHA 发明人 Hirose Kenichi
分类号 G21K5/00;H05K3/00;H01L21/67 主分类号 G21K5/00
代理机构 Studebaker & Brackett PC 代理人 Studebaker & Brackett PC
主权项 1. An ashing apparatus comprising: a treatment chamber configured to place an object to be treated therein; a lamp chamber having an ultraviolet lamp, the ultraviolet lamp being configured to irradiate the object with an ultraviolet beam, the treatment chamber and the lamp chamber being moved relative to each other and in parallel to a surface to be treated of the object, the treatment chamber having a stage to support the object, a gas inlet opening formed in the stage to supply a treatment gas into the treatment chamber in a direction perpendicular to the surface to be treated, and a gas outlet opening formed in the stage to discharge the treatment gas from the treatment chamber in the direction perpendicular to the surface to be treated; and a window member configured to transmit the ultraviolet beam therethrough, and secured to the treatment chamber, the window member being configured to partition the treatment chamber and the lamp chamber from each other, the lamp chamber and the treatment chamber being moved relative to each other in parallel to a flowing direction of the treatment gas in the treatment chamber while the treatment gas is flowing from the gas inlet opening to the gas outlet opening and the ultraviolet lamp is emitting the ultraviolet beam.
地址 Tokyo JP