APPARATUS AND METHOD OF MASK INSPECTION

摘要

PURPOSE: To achieve inspection with slight modification of an existing apparatus by scanning a particle beam mask with an inspection beam and forming a scanned beam passage in an electron microscope where the scanning is performed. CONSTITUTION: Through-holes 1, 3 are provided in a beam path of an electron or ion beam projection apparatus that is accurately focused, and preferably a coordinate table for a mask 2 to be inspected is formed, and/or a rotatable container table 4 is disposed at need. Below the table through-hole passages 3 disposed are a secondary quantum or secondary beam 6 emitter surface 5 produced from an inspection beam passing through an X ray transmission region or an opening 1 lay on the container table 4 and a detector 7 for the secondary quantum produced from the emitter surface 5 and for the secondary beam 6 produced from the emitter surface 5. A signal of the detector 7 after modulation may be supplied to an image memory at need.