| 摘要 |
<p>PURPOSE:To correct a position aligning with an output of an observation optical system and to improve an aligning accuracy by disposing a writable/erasable recording medium outside an element to be exposed, placed on a moving stage, and detecting the variations in the magnification, focus of an optical system for exposing and transferring a pattern on a first article on the element to be exposed by the observation optical system. CONSTITUTION:A light irradiated from an illumination optical system 1 of an aligner is irradiated to a reticle 2 as a first article, and its pattern is transferred by a projecting optical system 3 to a wafer 4 as a second article. The wafer 4 is placed on a moving stage 5, an optomagnetic recording medium 6 is disposed as a recording medium outside the wafer 4, its height is set to substantially the same as that of the wafer 4, and a magnetic field is applied by an electromagnet 7 buried in the lower section of the medium 6 in the optical axis direction of the system 3. The part of the exposure light of the system 1 is irradiated by mark illumination optical systems 11a, 11b, the mark of the reticle 2 is detected, the variations in the magnification and focus of the system 3 are detected, and an accurate alignment preferably corrected is conducted.</p> |
