发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 PURPOSE:To effectively use an effective exposure region and cope with the tendency to increasing chip size, by making the configuration of the chip region for pattern formation into a hexagon or a polygon having more sides. CONSTITUTION:In an IC chip which is a polygon more than hexagon, when a chip pattern of an octagon is made in an effective exposure region on an IC chip shaped in a polygon having six or more sides, a region in which a pattern is formed the region for pattern formation is defined by an octagon which is made by the four sides of a straight line section showing the effective exposure region corresponding to the outlines of a reticule and by the remaining four sides made by connecting an effective exposure region by straight lines. As a result, the octagon except for not-used effective exposure regions 6 of crescent-shaped parts shown by slanting lines, becomes effective exposure region, with the result that the not-used effective exposure region 6 is considerably decreased and the enlargement of the IC chip is implemented. As a result, it is possible to effectively use the effective exposure region 6 and cape with the tendency to increasing chip size without causing the enlargement of the aperture of a reduced lens.
申请公布号 JPS6481221(A) 申请公布日期 1989.03.27
申请号 JP19870237840 申请日期 1987.09.22
申请人 MATSUSHITA ELECTRON CORP 发明人 HATSUTA JIYUNKO;KAWAI HIDEKI
分类号 H01L21/30;G03F1/00;H01L21/02;H01L21/027;H01L29/02 主分类号 H01L21/30
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