发明名称 LIQUID CHEMICAL APPLICATOR
摘要 PURPOSE:To reduce the variance in the thickness of a liq. chemical film to be formed on a square-shaped substrate by providing the hole of an air current control plate above the center of rotation of the substrate, and dripping the chemical from the hole. CONSTITUTION:The air introduced by the exhaust from an exhaust pipe 5b from air holes 4b is passed through the hole 7 bored in the air current control plate 6 and having about 15mm diameter. It is concentrated toward the rotation center of the substrate 1 attached on the lower cup 5 rotating at 30r.p.m. and flows in the direction E at a high speed. Consequently, the liq. chemical supplied from a liq. chemical nozzle 3 is passed through the hole 7, dripped toward the center of rotation of the substrate 1, and dried by the air from the hole 7, and the viscosity of the chemical is increased. The substrate 1 is rotated at 300r.p.m. to extend the chemical, and then rotated at 3,000r.p.m. to apply the chemical on the whole substrate 1. Since the drying of the chemical is promoted by the air current from the hole 7 in this way and the viscosity is regulated, the variance in the film thickness is reduced.
申请公布号 JPS6470168(A) 申请公布日期 1989.03.15
申请号 JP19870226580 申请日期 1987.09.11
申请人 HITACHI LTD 发明人 KISHIDA JUICHI;KIDAI YUTAKA;NAGAI KUSUO
分类号 G03C1/74;B05C11/08;G03F7/16;H01L21/027;H01L21/31 主分类号 G03C1/74
代理机构 代理人
主权项
地址