| 摘要 |
<p>PURPOSE:To improve the contrast under a strong light source by using an amorphous alloy material contg. germanium as one of essential components and consists essentially of any among carbon, nitrogen and oxygen as a nonlinear type resistance film. CONSTITUTION:The amorphous material essentially consisting of the germanium and nitrogen is formed by a plasma CVD method using a gaseous mixture composed of gaseous nitrogen, gaseous ammonia and gaseous germane. The amorphous material essentially consisting of the germanium and the nitrogen has the photoconductivity which is about <=1/5 the photoconductivity of the amorphous material essentially consisting of silicon and nitrogen. The light leak current in the low voltage region of the nonlinear type element is, therefore, decreased by using the amorphous alloy consisting of the germanium as one of the essential components and having the low photoconductivity as the nonlinear type resistance material 6. The liquid crystal electro-optical device which is not degraded in quality even under strong photoirradiation such as outdoors is thereby obtd.</p> |
