| 摘要 |
<p>A process and apparatus for controlled arc coating of substrates (41) utilizing relatively thick cathodes or targets (20) for obtaining coatings which are free of macro-particles. The thick targets (20) are capable of use by controlling and steering the arc in a desired path as necessary to produce coatings of the desired compositions using magnetic fields generated to provide arc path control and modulation for efficient target utilization.</p> |
