发明名称 PHOTOPOLYMERIZABLE COMPOSITION
摘要 A photopolymerizable composition comprising an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator, characterized in that the initiator comprises (a) a compound of the formula: <IMAGE> (I) wherein R1 and R2 are alkyl group, n is 1, 2 or 3 and ring A is an aromatic ring containing nitrogen atom, and (b) hexaarylbiimidazole. The initiator may additionally contain a thiol of the formula: <IMAGE> (II) wherein Z is -O-,-S- or -NH-. The composition is not only highly sensitive to ultraviolet ray but also highly stable in storage.
申请公布号 DE3476068(D1) 申请公布日期 1989.02.16
申请号 DE19843476068 申请日期 1984.10.09
申请人 MITSUBISHI CHEMICAL INDUSTRIES LIMITED 发明人 NAGASAKA, HIDEKI
分类号 C08F2/00;C08F2/50;G03F7/004;G03F7/031;(IPC1-7):C08F2/50;G03C1/68 主分类号 C08F2/00
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