发明名称 |
Exposure apparatus |
摘要 |
A reduction projection exposure apparatus includes an excimer laser beam source, and a concave spherical mirror disposed in the optical path between the light source optical system and a reticle, so as to minimize the overall height of the optical system (in particular, the reduction projection exposure apparatus) and to increase the degree of freedom of optical design. The apparatus is more than 25% shorter than the conventional apparatus, and a high degree of freedom is obtained in the optical design.
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申请公布号 |
US4805002(A) |
申请公布日期 |
1989.02.14 |
申请号 |
US19870061263 |
申请日期 |
1987.06.12 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO. LTD. |
发明人 |
SASAGO, MASARU;ENDO, MASAYUKI;OGAWA, KAZUFUMI;ISHIHARA, TAKESHI |
分类号 |
G03F7/20;(IPC1-7):G03B27/54;G03B27/42 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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