发明名称 PREPARATION AND PRODUCTION OF RAW MATERIAL POWDER OF SPUTTERING TARGET FOR PRODUCING OXIDE THIN FILM
摘要 PURPOSE:To obtain a raw material powder from which the titled target free from disintegration is formed easily, safely and efficiently by mixing a starting raw material consisting of metallic powder and oxide (precursor) powder of respective prescribed amounts in an inactive solvent under the O2-contg. atmosphere and thereafter drying the mixture under the O2-contg. atmosphere. CONSTITUTION:The starting raw material powder wherein elements of IIA of the periodic table such as Be, Mg, Ca, Sr, Ba and Ra, elements of IIIB such as lanthanide and Y and Cu are contained as a main component and at least one component selected from among these respective components is metallic powder and the other components are the powder of oxide or a precursor such as carbonate which is made to oxide by heating, is uniformly mixed at the respective prescribed amount in an inactive solvent such as toluene, hexane and acetone under the O2-contg. atmosphere such as O2 or air, and the surface of the metallic powder is covered with a film of oxides, etc., and then this mixture is dried under the O2-contg. atmosphere. Then this obtained the raw material powder is molded into a prescribed shape and sintered at 600-950 deg.C under the partial pressure of oxygen not higher than 10Torr and the titled target free from disintegration is obtained.
申请公布号 JPS6425975(A) 申请公布日期 1989.01.27
申请号 JP19870180153 申请日期 1987.07.21
申请人 AGENCY OF IND SCIENCE & TECHNOL;UBE IND LTD 发明人 IHARA HIDEO;YOSHII SHIZUKA;DAIMON HIROSHI;FUJII KAZUHIRO
分类号 C04B35/00;C01G1/00;C04B35/45;C23C14/34;H01B12/00;H01B13/00 主分类号 C04B35/00
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