发明名称 A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE COMPRISING AN MOS TRANSISTOR AND A BIPOLAR TRANSISTOR AND A MANUFACTURING METHOD OF THE SAME
摘要 <p>A semiconductor integrated circuit device is disclosed which comprises a bipolar transistor and a field effect transistor, in which a gate electrode of the field effect transistor and a collector electrode of the bipolar transistor are formed from a common electrode layer of a high impurity concentration, and in which the collector region of the bipolar transistor comprises a region of a high impurity concentration having a conductivity type the same as that of the collector region of the bipolar transistor.</p>
申请公布号 EP0139266(B1) 申请公布日期 1989.01.25
申请号 EP19840111849 申请日期 1984.10.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IWASAKI, HIROSHI C/O PATENT DIVISION
分类号 H01L21/76;H01L21/225;H01L21/331;H01L21/8249;H01L27/06;H01L29/73;H01L29/732;(IPC1-7):H01L27/06;H01L21/82 主分类号 H01L21/76
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