| 摘要 |
PURPOSE:To obtain easily an electrode having an arbitrary circuit pattern, by performing etching while a voltage is applied using a transparent conductive film as an anode, after the transparent electrode whose main component is indium oxide is formed on a substrate. CONSTITUTION:A transparent conductive film is formed on a glass substrate by high frequency sputtering method applying a material wherein indium oxide and aluminum fluoride are mixed with a weight ratio of 95:5 and sintered. This is annealed in a vacuum. After a photoresist is spread thereon, baking is performed. After exposed with a high pressure mercury lamp, the substrate is dipped in a developing solution, and further baked to form a line-type resist pattern, which is etched by applying sulfuric acid to an etching solution. In this process, a voltage of 5V is applied by using the transparent conductive film and a platinum plate as an anode and a cathode, respectively. Thereby, the pattern of transparent electrode which coincides completely with the resist pattern is formed. |
