| 摘要 |
PURPOSE:To obtain a photosetting laminate having high alkali resistance by consisting said laminate of a photosetting layer and base and incorporating specific compds. as essential components into the photosetting layer. CONSTITUTION:This laminate consists of the photosetting layer and the base. The photosetting layer contains 5-1,000pts.wt. compd. (b) in which a hydroxyl group of alcohols or phenols is substd. with a group expressed by the formula B1, B2 or B3 and has compatibility with the compd. (a) as the essential component per 100pts.wt. compd. (a) contg. the repeating structural unit expressed by the formula I. In the formula, R0 denotes a vinyl group, epoxy group or episulfide group; R1 denotes hydrogen, alkyl group of 1-6C or halogen. R1 and R0 are substd. to any of ortho, meta or para position in the carbon atom. of the main chain. In the formula B1, X1 denotes H or CH3. This material is thereby used as a photoresist material having excellent alkali resistance. |
