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发明名称
PLASMA THIN FILM DEPOSITION PROCESS CONTROL
摘要
申请公布号
IE882040(L)
申请公布日期
1989.01.15
申请号
IE19880002040
申请日期
1988.07.05
申请人
KENJI WATANABE,
发明人
分类号
C23C14/22;C23C14/34;C23C16/44;C23C16/52;G01N21/25;(IPC1-7):C23C14/22
主分类号
C23C14/22
代理机构
代理人
主权项
地址
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