| 摘要 |
PURPOSE:To improve solvent resistance of a pattern by using a specified photoreactive crosslinking resin compsn. CONSTITUTION:A photoreactive crosslinking resin compsn. consists of a polymer (e.g. polyvinyl cinnamate) having crosslinking functional groups and photoreactive functional groups, and a low molecular compd. (e.g. methyl cinnamate) which can cause photoreaction with the afore-mentioned polymer. After forming a thin film 1 from said compsn. on a substrate 2, the thin film is exposed through a photomask 3 to cause a reaction in the film 11 at the exposed part. Then, the low molecular compd. 111 at the unexposed part is removed under reduced pressure and/or by heating to cause decrease of its volume. The whole body of the film is crosslinked by exposing the whole surface of the film simultaneously or after decreasing the volume. Thus, a pattern 13 is formed. By this process, gratings or lenses having high solvent resistance are formed in large amt. inexpensively. |
