发明名称 Method for preparing substrates for subsequent electroless metallization.
摘要 <p>A process for preparing a substrate, e.g., an epoxy printed circuit board, for subsequent metallization. Active chemical sites are formed adhering to the substrate surface. The substrate is then exposed to a vapor of a volatile organometallic compound, which chemically reacts with the active sites and is decomposed to at least a species of the metal constituent of the compound. This species adheres to the substrate and can be transformed into the free metal which is useful as a seed for subsequent electroless deposition of a metal thereon. If selective deposition is desired, a resist masking layer is used prior to forming the seed layer.</p>
申请公布号 EP0298345(A2) 申请公布日期 1989.01.11
申请号 EP19880110292 申请日期 1988.06.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CLARKE, THOMAS CARL;KOVAC, CAROLINE ANN;JUNG, DAE YOUNG;PARK, JAE MYUNG;THOMAS, RICHARD RONALD
分类号 C23C16/06;C23C16/04;C23C16/18;C23C18/16;C23C18/20;C23C18/28;C23C18/30;H01L21/288;H05K3/14;H05K3/18 主分类号 C23C16/06
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