| 发明名称 |
Target for the deposition of magnetic material by magnetron cathodic sputtering |
| 摘要 |
Target for the deposition of magnetic material by magnetron cathodic sputtering, which has the general shape of a disc and is intended to be deposited on a circular magnetron cathode. The target 20 has at least one gap 27 defining a central part 21 and a ring 22 surrounding this central part. <IMAGE>
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| 申请公布号 |
FR2617505(A1) |
申请公布日期 |
1989.01.06 |
| 申请号 |
FR19870009239 |
申请日期 |
1987.06.30 |
| 申请人 |
LCC CIE EUROP COMPOSANTS ELECTRO |
发明人 |
JEAN-LUC ROLLAND, HENRIETTE MAGNA, PHILIPPE DUSSUEL, ETIENNE ROUSSELET E;MAGNA HENRIETTE;DUSSUEL PHILIPPE;ETIENNE ROUSSELET E |
| 分类号 |
C23C14/34;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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