| 摘要 |
PURPOSE:To improve the safety of a system in which a gas for vapor growth is fed into a reaction furnace to carry out the vapor growth of a crystal on a wafer, by separately arranging a body chamber, a gas feeding chamber and a remote operation chamber in the system. CONSTITUTION:This vapor growth system is composed essentially of a body chamber, a gas feeding chamber and an operation chamber and the chambers are separately arranged. The body chamber contains a reaction furnace and a gas controller for controlling a gas for vapor growth in the furnace. The operation chamber contains an operation board for the remote operation of the controller. The gas for vapor growth is fed in the reaction furnace to carry out the vapor growth of a crystal on a wafer in the furnace.
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