发明名称 |
PART HAVING COATING FILM CONTAINING SIC AND FORMATION OF SAID COATING FILM |
摘要 |
PURPOSE:To easily form an SiC-containing coating film containing SiC and Si and having high adhesivity, by forming a pure Si layer or an Si layer containing a small amount of SiC on a silicon nitride substrate and successively increasing the content of SiC. CONSTITUTION:A pure Si layer or an Si layer containing a small amount of SiC is deposited on a silicon nitride substrate 1 by passing pure silicon raw material gas (e.g. SiCl4) or a silicon raw material gas containing a small amount of a carbon raw material gas (e.g. C3H8). The ratio of the carbon raw materials gas in the silicon raw material gas is successively increased to form an SiC- containing coating film 2 containing SiC and Si. The part having the obtained SiC-containing coating film 2 has excellent corrosion resistance and abrasion resistance of SiC. Since the coating film 2 contains Si, the thermal expansion difference between the film and the silicon nitride substrate 1 is decreased to keep the film from peeling and cracking.
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申请公布号 |
JPS63315584(A) |
申请公布日期 |
1988.12.23 |
申请号 |
JP19870150996 |
申请日期 |
1987.06.17 |
申请人 |
MITSUI ENG & SHIPBUILD CO LTD |
发明人 |
FUJITA FUSAO;KAYANE MIHARU |
分类号 |
C04B41/87 |
主分类号 |
C04B41/87 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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