| 摘要 |
<p>PURPOSE:To prevent the aggravation of the flatness of the surface of a semiconductor substrate and its defocusing, by providing the projections, whose area of the point part is formed narrower than the base parts, on the part of semiconductor substrate mount at regular intervals. CONSTITUTION:A plurality of projections 12 en bloc with a carrier belt 11 are provided on the part of semiconductor substrate 2 mount at regular intervals. These projections 12 are formed, for instance, about in the shape of a four-cornered drill and their point parts 12a are formed sufficiently smaller than the base parts 12b together with having the area able to obtain the frictional resistance for holding the semiconductor substrate 2 on the carrier belt. Further, in case the carrier belt 11 is made of a material which allows the elastic deformation of the point part 12a of the projection 12 under the deadweight of the semiconductor substrate, the area of the point part 12a can be formed further narrower so that foreign matter may be hard to stick to the rear of the semiconductor substrate. Thereby, while holding a cleanliness factor of the rear of the semiconductor substrate 2, carriage can be performed so as to be able to prevent defocusing inside a reduction projection aligner.</p> |
