发明名称 |
PRODUCTION OF THIN METALLIC FILM |
摘要 |
PURPOSE:To prevent the thermal damage of a high-polymer substrate in a vapor deposition part and to prevent wrinkling after passage through the vapor deposition part by setting the potential difference between a thin metallic film surface and a can in the position where the high-polymer substrate parts from the can at the value smaller than the potential difference between the thin metallic film surface and the can in the vapor deposition position. CONSTITUTION:The potential difference between the thin metallic film surface and the can 3 in the position where the high-polymer substrate 2 parts from the can 2 is set smaller than the potential difference between the thin metallic film surface and the can 3 in the vapor deposition position to decrease the electrostatic attraction between the substrate 2 and the can 3 after the passage through the vapor deposition part and to simultaneously apply the sufficient electrostatic attraction between the substrate 2 and the can 3 to the vapor deposition part. Both the thermal damage of the high-polymer substrate 2 in the vapor deposition part and the wrinkling of the high-polymer substrate 2 after the passage through the vapor deposition part are thereby prevented.
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申请公布号 |
JPS63306531(A) |
申请公布日期 |
1988.12.14 |
申请号 |
JP19870142624 |
申请日期 |
1987.06.08 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
HONDA KAZUYOSHI;SUGITA RYUJI;TOMA KIYOKAZU;NANBU TARO |
分类号 |
C23C14/20;C23C14/30;G11B5/85;H01B13/00 |
主分类号 |
C23C14/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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