PRODUCTION OF SPUTTERED MAGNETIC DISK

摘要

PURPOSE:To improve magnetic characteristics by projecting sputtering Cr atoms onto a substrate at a prescribed angle of inclination toward the diametral direction of the substrate by using a sputtering technique of a static opposed type thereby forming an underlying Cr film. CONSTITUTION:A high-frequency power supply 24 is connected between the disk substrate 18 on an electrode 14 of a sputtering chamber 10 and a Cr target 20 having the diameter smaller than the diameter of the substrate 18 on the electrode 16 and sputtering is executed. A discharge region spreading to a truncated circular cone shape from the target 20 toward the substrate 18 is thereby formed and the sputtering atoms driven out of the target 20 enter the substrate 18 at the prescribed angle of inclination inclined toward the diametral direction. The underlying Cr film which is deposited on the substrate 18 and is controlled of the crystal direction in the intra-surface direction is thus formed. The film of easy magnetization is oriented in the circumferential direction of the substrate 18 and the magnetic characteristics are improved if a magnetic Co film is formed thereon by a sputtering method, etc.