发明名称 MANUFACTURE OF THIN FILM SUPERCONDUCTIVE MATERIAL
摘要 PURPOSE:To obtain a superconductive material of a high accuracy by decomposing a specific raw material for the superconductive material into minute particles of an atomic state, depositing them on a substrate and irradiating hydrogen ions. CONSTITUTION:Hydrogen ions are irradiated to a complex compond film of an oxide containing an element A, an element B and Cu constituted with the mol ratio of the elements of 0.5<=(A+B)/Cu<=2.5. Here, A denotes at least one element of Sc, Y and an element of lanthanum family (atomic numbers 57-71), and B at least one element from the IIa group. Since the raw material of the superconductive material is deposited on the substrate after being decomposed into tiny particles of the atomic state, the composition of the superconductive material formed becomes uniform. Furthermore, hydrogen ion treatment has a good controllability, enabling the treatment within a short period of time, and compensates crystal defect to obtain a desired crystal structure. This makes it possible to obtain the superconductive material of a high accuracy.
申请公布号 JPS63299019(A) 申请公布日期 1988.12.06
申请号 JP19870135253 申请日期 1987.05.29
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SETSUNE KENTARO;KAMATA TAKESHI;HIRAO TAKASHI;WASA KIYOTAKA
分类号 H01L39/24;C23C14/06;C30B25/06;C30B29/22;H01B12/06;H01B13/00;H01L39/12 主分类号 H01L39/24
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