| 摘要 |
PURPOSE:To make it possible to obtain excellent alignment accuracy by a method wherein a reticle pattern image is exposed on the fluorescent flat plate provided on a stage, and the position of the fluorescent pattern on the fluorescent flat plate is measured by an off-axis alignment system. CONSTITUTION:A fluorescent flat plate LP is provided on a stage S, and after a reticle pattern image has been exposed to a fluorescent flat plate LP using an exposing light through the intermediary of a projection optical system, the position of the fluorescent pattern on the fluorescent flat plate LP is measured by position detecting means WX, WY and Wtheta of off-axis alignment utilizing the fluorescence emitted from the fluorescent flat plate LP for a fixed period after exposure. Accordingly, an image can be formed without being affected by the color aberration of the projection optical system consisting of a nomogenous color lens, and the position of the reticle pattern image can be measured accurately. As a result, excellent overlapping accuracy can be obtained without using a through-the-lens alignment. |
