| 摘要 |
PURPOSE:To reduce influence of dust sharply by a method wherein a mask- retaining part or a wafer-retaining part for an aligner is kept at a low pressure so that the dust floating in the neighborhood can be excluded. CONSTITUTION:The neighborhood of a mask holder 3 retaining a mask installed under a light source 1 and the neighborhood of a wafer holder 5 retaining a wafer at the lower part of the mask holder are surrounded airtightly by a partition wall 8 having a transparent plate 7 composed of a material transmitting the light from the light source 1 and the inside of this partition wall is kept at a low pressure of less than 100 Torr. Because the neighborhood of the mask 2 and the wafer 4 is maintained at a low pressure in this manner, dust floating in the neighborhood is excluded and it is possible to eliminate influence caused by the dust.
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