发明名称 Method for preparing thin film of compound oxide superconductor.
摘要 <p>A method for preparing a thin film of a composite oxide superconductor with a deposition source of the compound oxide, by applying an oxygen ion beam from an ion source onto a substrate while changing beam intensity with formation of a superconducting thin film thereby to physically deposit evaporative particles from the deposition source on the substrate.</p>
申请公布号 EP0292958(A2) 申请公布日期 1988.11.30
申请号 EP19880108406 申请日期 1988.05.25
申请人 SUMITOMO ELECTRIC INDUSTRIES, LIMITED 发明人 FUJITA, NOBUHIKO ITAMI WORKS OF SUMITOMO ELECTRIC;ITOZAKI, HIDEO ITAMI WORKS OF SUMITOMO ELECTRIC;TANAKA, SABURO ITAMI WORKS OF SUMITOMO ELECTRIC;YAZU, SHUJI ITAMI WORKS OF SUMITOMO ELECTRIC;JODAI, TETSUJI ITAMI WORKS OF SUMITOMO ELECTRIC
分类号 H01L39/12;H01L39/24 主分类号 H01L39/12
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