| 摘要 |
PURPOSE:To accurately and easily adjust composition of NiFe metal plating, by measuring the magnetostrictive constant of a metal plating film on a monitor. CONSTITUTION:The NiFe metal plating is applied on a wafer 2 produced as a product also on the monitor having thickness <=1mm, and the magnetostrictive constant of an NiFe on the monitor is measured. In other words, for example, two sheets of wafers 2 made of ceramics with thickness of 4mm and the monitor 3 made of glass with thickness of 0.3mm are mounted on a cathode plate 1, and the NiFe metal plating are applied on the surfaces of the wafers 2 and the monitor 3 simultaneously. After completing prescribed metal plating, the monitor 3 is removed, and the magnetostrictive constant is measured. Constant relation exists between the magnetostrictive constant and the composition of the NiFe metal plating film, and ferrous sulfate and nickel sulfate are used in the adjustment of metal plating liquid. In such a way, it is possible to perform the control of the composition of the NiFe metal plating accurately and easily. |
