| 摘要 |
PURPOSE:To facilitate the uniform projection of radiation and the size reduction of equipment by a method wherein the radiation is successively reflected by a pair of mirrors provided in parallel to each other and one of the mirrors is shifted in parallel so as to increase an application area. CONSTITUTION:If a synchrotron radiation is successively reflected by a pair of mirrors 2 provided in parallel to each other, the light entering a pair of the mirrors 2 and the light outgoing from the mirrors 2 are always in parallel to each other so that the synchrotron radiation in the horizontal direction which is taken out of the orbits of electrons can be applied to an object while the horizontal direction is maintained. Therefore, a wafer 3, a pattern mask 4 and so forth which are the exposed surfaces can be prepared vertically without being inclined. Moreover, if the reflected light is moved in a parallel plane while the angle of incidence of the radiation is kept constant to increase an application area, as the angle of incidence is not varied, the uniform application can be realized only by moving the mirror in parallel at a constant speed with out changing the spectrum and intensity of the light reflected by the mirrors. Further, as the distance between the mirrors and the exposed object need not be large, the size of the equipment can be reduced. |
