发明名称 ALLOY TARGET FOR PREPARATION OF THIN FILM
摘要 PURPOSE:To impart a lower tendency to cracking and higher oxidation resistance to an alloy target and to eliminate the need for presputtering by incorporating Pt and/or Pd into the target. CONSTITUTION:The titled target consists of Fe and Pt and/or Pd(A) and >=1 kinds of rare earth elements (B) and the content of the component A is specified to >=15atom.%. The oxidation resistance of the resultant target is not enough and there is the possibility that the coercive force of the formed thin film varies with time if the content of the component A is below 15atom.%. The component B is preferably selected from La, Ce, Pr, Nd, Pm, Sm, Eu, Tb, Dy, Ho, Er, Tm, Yb, and Lu. The target for preparation of perpendicularly magnetized films which has the lower tendency to cracking and the excellent oxidation resistance and does not require the presputtering is thereby obtd.
申请公布号 JPS63285736(A) 申请公布日期 1988.11.22
申请号 JP19870118958 申请日期 1987.05.18
申请人 MITSUI PETROCHEM IND LTD 发明人 HARUTA KOICHI;MIZUMOTO KUNIHIKO;KAJIURA HIROICHI
分类号 C23C14/34;G11B11/10;G11B11/105;H01F41/18 主分类号 C23C14/34
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