发明名称 PHOTOMASK PELLICLE
摘要 <p>PURPOSE:To enable uniform mounting of a pellicle frame to a photomask substrate without having clearances, air bubbles, etc., by forming the angle parts of the pellicle frame to a prescribed shape. CONSTITUTION:The pellicle frame 1 is formed of straight parts 1a and arced parts 1b. The parts 1b are formed to such a shape at which the outside peripheral length and the circumferential length are the same. An adhesive agent 3 is spread over the entire surface of a mounting part by this shape at the time of pressing and adhering the frame 1 via the adhesive agent 3 to the photomask substrate 4. The pellicle frame is thus uniformly mounted to the substrate without generating the clearances, air bubbles, etc.</p>
申请公布号 JPS63284552(A) 申请公布日期 1988.11.21
申请号 JP19870119219 申请日期 1987.05.15
申请人 MITSUBISHI ELECTRIC CORP 发明人 YANO SHOJI
分类号 G03F1/00;G03F1/64;H01L21/027;H01L21/30 主分类号 G03F1/00
代理机构 代理人
主权项
地址