发明名称 METHOD FOR MOUNTING PHOTOMASK PELLICLE
摘要 <p>PURPOSE:To obtain a uniform mounting part which has no clearances, air bubbles, etc., with a small pressing force by executing pressurization dividedly plural times in the case of mounting a photomask pellicle frame to a photomask substrate via an adhesive agent under the pressing force exerted thereto. CONSTITUTION:The photomask substrate 4 is previously positioned and fixed and the pressing force of the prescribed magnitude is exerted to the pellicle frame 1 to hold the frame for a prescribed period of time and to adhere the same tentatively by the adhesive agent 3. The adhesive agent is thereby uniformly spread on the adhering surface. The pressing force is then once released and the pressing force for the purpose of remounting is exerted to the frame to hold the frame for the specified period of time, by which the mounting stage is completed. The clearances, air bubbles, etc., of the adhesive agent are eliminated and the uniform mounting part is obtd. by the second time of the pressing.</p>
申请公布号 JPS63284551(A) 申请公布日期 1988.11.21
申请号 JP19870119218 申请日期 1987.05.15
申请人 MITSUBISHI ELECTRIC CORP 发明人 YANO SHOJI
分类号 G03F1/00;G03F1/62;H01L21/027;H01L21/30 主分类号 G03F1/00
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