| 摘要 |
PURPOSE:To enable two system of moving and stationary sputtering with one sputtering device of a simple structure by holding the plural works opposed to radially arranged target materials on a concentric circle, and providing a means for confirming the rotation stop position of a pallet supported by a reciprocating spindle. CONSTITUTION:Plural works W are held on a concentric circle on the vertical pallet 9, and the pallet supporting spindle 23 reciprocating between the positions of both side walls of a treating chamber 2 opposed to each other is provided. A stepping motor 24 is connected to at least one spindle 23b. Plural attachable and detachable target materials 25 are radially arranged on at least one side wall of the treating chamber 2. The means 27 for confirming the rotation stop position of a pallet is further provided at specified position of the treating chamber 2. As a result, sputtering can be carried out with only one sputtering device by continuously rotating the pallet 9 by the motor 24 to revolve or revolve and rotate the work W. In addition, the work W is accurately rested on a specified position by intermittently rotate the pallet 9 by the control of the speed of the motor 24 and the means 27, and sputtering is carried out. |
