发明名称 PRODUCTION OF SYNTHETIC QUARTZ GLASS
摘要 PURPOSE:To obtain a large-sized quartz glass block having a required shape with one step by depositing and melting quartz glass in a vessel having the prescribed dimension and shape in the case of producing synthetic quartz glass by hydrolysis of silicon halide under high temp. CONSTITUTION:A synthetic quartz block is formed by hydrolyzing silicon halide (preferably SiCl4) under high temp. to generate fine silica and depositing it on/into a base body and simultaneously melting and vitrifying it with its sensible heat. In this case, the base body having the prescribed dimension and shape is used as a starting member and the large-sized quartz block having the required dimension and shape is obtained by melting and depositing quartz glass on the base body. The temp. of the melted and deposited face of quartz glass is regulated to about 1,800-1,950 deg.C. As the above-mentioned base body, it consists of an outer structural body 13 and an inner structural body 12 and also this inner structural body 12 is preferably divided into four or more pieces. Furthermore a gap having >=5mm width is provided between the inner structural body 12 and the outer structural body 13 and inactive fine particles (e.g. SiC) 14 are packed in this gap and thereby the thermal expansion difference of quartz and the material of the vessel can be absorbed.
申请公布号 JPS63282133(A) 申请公布日期 1988.11.18
申请号 JP19870113632 申请日期 1987.05.12
申请人 ASAHI GLASS CO LTD 发明人 KOBAYASHI SHIGEYOSHI;IKEMURA MASAAKI;OTA YUKINORI;WATABE KENJI
分类号 C03B8/04;C03B19/01;C03B19/09;C03B19/14;C03B20/00 主分类号 C03B8/04
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