Reflector apparatus for chemical vapor deposition reactors.

摘要

A reflector apparatus with multiple reflecting facets for chemical vapor deposition reactors. For vertical and barrel reactor, the facets are annular and fit around the bell-jar shaped process enclosure. The facets may be adjusted by orienting or curving the reflecting facet surfaces so that the radiant energy from the reactor susceptor may be reflected back to the susceptor as desired for uniform heating of the processed semiconductor wafers.